Tantalum (Ta) Sputtering Target

Material Tantalum Formula Ta Purity 99.995% Typical Substrates Silicon Related Materials Pt, Cu, Al   Tantalum (Ta) is a blue-grey refractory metal and is an excellent choice for sputtering target material because it has a strong resistance to corrosion, excellent electrical conductivity, and a high melting point. Tantalum, can be deposited by both sputtering and evaporation. The Common Uses of Tantalum in Thin Film Form Tantalum (Ta) is a refractory metal critical to the architecture of microchips. High purity Ta targets are used to sputter microscopic thin layers of tantalum on silicon wafers, enabling the manufacturing semiconductor logic chips with high performance. In addition, it is used as a diffusion barrier in semiconductor processing, and as a protective coating in the medical industry. What are the Typical Properties of Ta in Thin Film Form? Tantalum thin films offer excellent electrical and thermal conductivity, and a high melting point. The electrical c