Chromium (Cr) Sputtering Target

Chromium (Cr) Sputtering Target

$80.00
{{option.name}}: {{selected_options[option.position]}}
{{value_obj.value}}

Material Chromium Formula Cr Purity 99.99% Typical Substrates Si, Ge, GaAs, Glass and various other metal Related Materials Ti, Ni, Co, Al   Chromium (Cr) thin films are widely used in research and commercial applications across a range of industries. Cr thin films are used in flat panel displays, hard coatings, optical communications, magnetic data storage devices and electron microscopy. Cr thin films are commonly used to create anti-reflective coatings, protective layers, multilayer optical films, and magnetic films. The utility of Cr thin films stems from their excellent electrical and optical properties, such as reflectivity, electrical conductivity, and thermal stability. Cr thin films also offer low cost and low maintenance as well as high corrosion resistance. Deposition Conditions for Chromium Films by DC Sputtering DC sputtering is a common method for depositing Cr thin films, and the deposition conditions will vary depending on the desired properties of the fi

Show More Show Less