Indium Gallium Oxide (In2O3:Ga2O3) PLD Target
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Indium Gallium Oxide (In2O3:Ga2O3) PLD Target

$350.00
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Material Indium Gallium Zinc Oxide Formula In2O3:Ga2O3 Common substrates Sapphire, Silicon, Glass Similar Materials ITO, ZnO, FTO, AZO, GZO Crystal Structure Wurtzite or amorphous in thin films form   Introduction to Indium Gallium Oxide (IGO) Thin Films as TCOs Indium Gallium Oxide (IGO) is a transparent conductive oxide (TCO) material that is commonly used in electronic devices such as solar cells, touch screens, and flat panel displays. IGO thin films exhibit high optical transparency and good electrical conductivity, making them ideal for use as transparent electrodes in these applications. Common Composiiton of IGO Targets We can make IGO to your requirement however the most common is In2O3:Ga2O3 ratio of 1:1.  IGO 50:50 (In0.5Ga0.5)2O3 IGO 60:40 (In0.6Ga0.4)2O3 IGO 80:20 (In0.8Ga0.2)2O3 IGO 90:10 (In0.9Ga0.1)2O3 IGO 95:5 (In0.95Ga0.05)2O3 Optical and Electronic Properties of IGO IGO thin films typically have high optical transmittance in the v

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