
Indium Oxide In2O3 PLD Target
Material Indium Oxide Formula In2O3 Purity 99.95% Typical Substrates YSZ, MgO, Al2O3 Related Materials ZnO, ITO, TiO2, AZO, Ga2O3 Introduction to Indium Oxide (In2O3) Thin Film Targets Indium oxide (In2O3) is a transparent and conductive oxide material commonly used in thin film form for optoelectronic and electronic applications. In2O3 thin films can be deposited by various techniques, such as pulsed laser deposition (PLD), sputtering, and chemical vapor deposition (CVD). Here, we will discuss the properties of In2O3 and its use in thin film form. Optical and Electronic Properties of In2O3 In2O3 has excellent optical and electrical properties, making it a popular choice for transparent conductive oxide (TCO) applications. Its bandgap is around 3.6 eV, which means it has good transparency in the visible region and high electrical conductivity in the near-infrared region. In2O3 also has a high electron mobility, making it a good choice for electronic applications. Comp