Aluminium Nitride (AlN) PLD Target

Material Aluminium Nitride Formula AlN Common Substrates Silicon, Sapphire, Similar Materials GaN, SiC, Diamond Crystal Structure Hexagonal Aluminum Nitride Targets for Pulsed Laser Deposition Introduction to AlN Aluminum Nitride (AlN) is a ceramic material that is widely used in thin film form due to its unique properties. AlN is a wide-bandgap semiconductor with excellent thermal conductivity, exhibits pieznoelectrocity, high electrical resistivity, and high mechanical strength. These properties make AlN a promising material for a wide range of electronic and optoelectronic applications, including power electronics, high-temperature sensors, and LEDs. Properties of AlN Thin Films AlN thin films exhibit high thermal stability and excellent mechanical properties, making them suitable for high-temperature applications. AlN thin films also have a high electrical resistivity, low dielectric constant, and high breakdown voltage, which make them suitable for high-frequen