Titanium Nitride (TiN) PLD Target

Material Titanium Nitride Formula TiN Common Substrates Silicon (Si), Sapphire (Al2O3), Similar Materials TiC, TiAlN Crystal Structure Face centred cubic (FCC)   TiN Targets for Pulsed Laser Deposition Introduction to TiN Titanium Nitride (TiN) is a hard, wear-resistant, and corrosion-resistant material that is widely used in thin film form for a variety of applications. TiN is a refractory material with high melting point, high hardness, and good adhesion to substrates, making it suitable for use in harsh environments. TiN thin films also have good electrical conductivity and low friction, making them useful in microelectronics and tribology applications. Properties of TiN Thin Films TiN thin films have a high hardness, good wear resistance, and low coefficient of friction, making them suitable for wear-resistant and anti-corrosion coatings. TiN thin films also have good adhesion to substrates, high thermal stability, and good electrical conductivity, making them s