P02900 - SEMI P29 - Specification for Characteristics Specific to Attenuated Phase Shift Masks and Masks Blanks
$187.00
{{option.name}}:
{{selected_options[option.position]}}
{{value_obj.value}}
This Specification covers the characteristics specific to attenuated phase shift masks and mask blanks. Referenced SEMI Standards SEMI P1 — Specification for Hard Surface Photomask Substrates SEMI P2 — Specification for Chrome Thin Films for Hard Surface Photomasks SEMI P22 — Guideline for Photomask Defect Classification and Size Definition SEMI P28 — Specification for Overlay-Metrology Test Patterns for Integrated-Circuit Manufacture
Show More
Show Less
Price History
$187
(+$7)