MF008400 - SEMI MF84 - Test Method for Measuring Resistivity of Silicon Wafers With an In-Line Four-Point Probe

 This Test Method  covers the measurement of the resistivity of silicon wafers with an in-line four-point probe. This Test Method describes a procedure that enables inter-laboratory comparisons of the room temperature resistivity of silicon wafers. The precision that can be expected depends on both the resistivity of the wafer and on the homogeneity of the wafer. Round-robin tests have been conducted to establish the expected precision for measurements on p-type wafers with room temperature (23°C) resistivity between 0.0008 Ω·cm and 2000 Ω·cm and on n-type wafers with room temperature (23°C) resistivity between 0.0008 Ω·cm and 6000 Ω·cm.This Test Method is intended for use on single crystals of silicon in the form of circular wafers with a diameter greater than 16 mm (0.625 in.) and a thickness less than 1.6 mm (0.0625 in.). Geometrical correction factors required for these measurements are available in tabulated form.  Procedures for preparing the specimen, for measuring its size, and for determining the temperature of the specimen during the measurements are also given. This Test Method includes procedures for checking both the probe head and the electrical measuring apparatus. The current level, probe force, and specimen surface preparation specified in this Test Method are to be preferred for all referee measurements on bulk silicon wafers. However, many changes in these conditions may be made for non-referee applications without severe changes in measurement results.  A table of temperature coefficient as a function of resistivity and abbreviated tables of correction factors appropriate to circular wafer geometry are included with the test method so that appropriate calculations can be made conveniently. This Test Method is to be used as a referee method for determining the resistivity of single crystal silicon wafers in preference to SEMI MF43. Referenced SEMI Standards (purchase separately)SEMI C19 — Specification for AcetoneSEMI C28 — Specification and Guide for Hydrofluoric AcidSEMI C31 — Specification for MethanolSEMI C35 — Specification and Guide for Nitric AcidSEMI M59 — Terminology for Silicon TechnologySEMI MF42 — Test Method for Conductivity Type of Extrinsic Semiconducting MaterialsSEMI MF43 — Test Method for Resistivity of Semiconductor MaterialsSEMI MF1527 — Guide for Application of Certified Reference Materials and Reference Wafers for Calibration and Control of Instruments for Measuring Resistivity of SiliconSEMI MF2074 — Guide for Measuring Diameter of Silicon and Other Semiconductor Wafers Revision HistorySEMI MF84-0312 (Reapproved 1023)SEMI MF84-0312 (Reapproved 0718)SEMI MF84-0312 (technical revision)SEMI MF84-0307 (technical revision)SEMI MF84-1105 (technical revision)SEMI MF84-02 (first SEMI publication)