Ultrapure Water System for Semiconductor Applications

Water Treatment Process: Single/Double-Stage Reverse Osmosis (RO), Double-Stage RO + EDI / PolishingProduct Water Output: 0.5 to 50 tons per hourProduct Water Quality: Resistivity ≥ 18.25 MΩ·cm or Conductivity ≤ 0.055 µS/cmFootprint: 5–400 m² Product Overview: Ultrapure water for semiconductor applications is essential across the entire chip manufacturing process. It is used for: Front-end: Cooling during silicon ingot slicing and wafer processing Mid-process: Cleaning in sputtering, photolithography, electroplating, and etching Back-end: Cleaning in inspection and packaging For LED chip manufacturing, ultrapure water is needed in: Epitaxial wafer growth (MOCVD stage) Photoresist exposure, development, and stripping Final inspection and packaging stages The semiconductor industry also imposes stringent requirements for Total Organic Carbon (TOC) control. Key Advantages: High Efficiency and Quality:System configured with pre-treatment + RO mainframe for efficient rem