Zirconium (Zr) Sputtering Target

Zirconium (Zr) Sputtering Target is a type of thin film deposition target used in physical vapor deposition (PVD) processes to deposit zirconium thin films onto substrates. It is made of high purity zirconium metal and is typically available in rectangular or circular shapes. Zirconium sputtering targets are used in a variety of applications including the production of thin films for electronic devices, optical coatings, and wear-resistant coatings. They are also used in the aerospace industry for thermal barrier coatings, and in the medical industry for the production of implants and dental restorations. The quality of the zirconium sputtering target is critical to the quality of the deposited thin films, and manufacturers take great care in producing high-purity targets with uniform density and grain structure. Zirconium sputtering targets can be made using a variety of processes, including hot pressing, cold isostatic pressing, and plasma spraying.   Zirconium Sputtering Target